- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/032 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Patent holdings for IPC class G03F 7/032
Total number of patents in this class: 448
10-year publication summary
|
27
|
30
|
32
|
44
|
42
|
21
|
35
|
32
|
28
|
12
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 27102 |
60 |
| LG Chem, Ltd. | 17205 |
38 |
| Samsung SDI Co., Ltd. | 6671 |
28 |
| Resonac Corporation | 2233 |
19 |
| Toray Industries, Inc. | 6652 |
18 |
| Taiyo Ink Mfg. Co., Ltd. | 219 |
15 |
| Cheil Industries Inc. | 944 |
11 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
10 |
| Samsung Display Co., Ltd. | 30585 |
9 |
| Merck Patent GmbH | 5909 |
8 |
| JSR Corporation | 2476 |
8 |
| Hitachi Chemical Company, Ltd. | 2455 |
7 |
| DIC Corporation | 3597 |
7 |
| Duk San Neolux Co., Ltd. | 512 |
7 |
| Boe Technology Group Co., Ltd. | 35384 |
6 |
| DONGWOO FINE-CHEM Co., Ltd. | 1163 |
6 |
| Kolon Industries, Inc. | 1506 |
6 |
| Taiyo Holdings Co., Ltd. | 221 |
6 |
| Kaneka Corporation | 4445 |
5 |
| Asahi Kasei Kabushiki Kaisha | 2429 |
5 |
| Other owners | 169 |